Download EBOOK Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics PDF for free


Download EBOOK Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics PDF for free Category: Technology & Engineering
The author of the book: M. L. Green
Format files: PDF, EPUB, TXT, DOCX
The size of the: 9.24 MB
Language: English
ISBN-13: 9781558994744
Edition: Materials Research Society
Date of issue: 1 September 1999

Description of the book "Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics":

Device scaling has been the engine driving the continued pervasiveness of the microelectronics revolution. The SIA roadmap calls for 4-5nm films (oxide equivalent thickness) in 2000, and

Download EBOOK Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics PDF for free


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M. L. Green

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Download EBOOK Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics PDF for free



Download EBOOK Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics for free

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